AO2000 SERIES - LIMAS11

The various Limas11 process photometers are easily configured to meet individual process measurement requirements.  The Limas11 UV and Limas11 IR photometers measure up to five (5) components (including the optionally installed oxygen sensor.  The Limas11 HW photometer measures up to four (4) components and uses the UV-RAS method (ultra-violet resonant absorption spectroscopy) to selectively measure the sample component NO.

Measurement Principle

Process photometer for measuring gas filter correlation or wavelength comparison:
- In ultraviolet and visible spectrum range λ = 200 - 600nm (Limas11 UV, Limas11 HW)
- In infrared spectrum range λ = 2.5 - 10µm (Limas11 IR)

Typical Applications

- Burner optimization	- Control of DeNOx installations
- Emission monitoring of FCC furnaces	- Nitric acid production
- Purity measurement in the chemical industry	- Cement production
- Production and processing of cellulose and viscose	- Natural gas conditioning
- Cl2 production and processing	- Plastics production
- Phosgene production processes

Sample Components - Smallest Measuring Ranges (examples)

Limas11 UV		Limas11 IR
- NO	0 - 10 ppm	- CO	0 - 500 ppm
- SO2	0 - 25 ppm	- CO2	0 - 150 ppm
- NO2	0 - 50 ppm	- HCl	0 - 2500 ppm
- H2S	0 - 25 ppm	- CH4	0 - 1000 ppm
- Cl2	0 - 100 ppm	- C2H2	0 - 1250 ppm
- CS2	0 - 50 ppm	- C2H4	0 - 1500 ppm
- COS	0 - 250 ppm	- C2H6	0 - 250 ppm
		- C3H6	0 - 500 ppm
Limas11 HW		- C3H8	0 - 150 ppm
- NO	0 - 25 ppm	- C4H10	0 - 250 ppm
- NO2	0 - 40 ppm
- NH3	0 - 25 ppm

Measuring Ranges

- 1 to 4 ranges per sample component
- Largest measurement ranges: 0 - 100 Vol.%, or 0 Vol.% to saturation, or 0 Vol.%
  to LEL
- Measurement ranges freely adjustable within a range ratio of 1:20 relative to the
  factory-set reference measuring range
- Electronic zero-point suppression, max. suppression ratio of 1:10